报告题目：contamination control for chip manufacturing
报告人：肖文博士
报告时间：2020年12月31日上午9:00-11:00
报告地点：新化学楼323室（腾讯在线会议）
报告摘要：Contamination control in a semiconductor fab is crucial for achieving acceptable device yields as feature size decreases and 3D structures proliferate. Advanced filtration and purification of air, bulk or specialty gas, and chemical throughout its process life cycle has become a critical aspect in reducing defects and enabling higher yields.
